TY - JOUR
T1 - Determination of the valence electronic structure of condensed trimethylaluminum by photoelectron spectroscopy and molecular orbital calculations
AU - Motooka, T.
AU - Rockett, A.
AU - Fons, P.
AU - Greene, J. E.
AU - Salaneck, W. R.
AU - Bergman, R.
AU - Sundgren, J. E.
PY - 1988/11
Y1 - 1988/11
N2 - The electronic structure of dimerized trimethylaluminum (TM A), Al2 (CH3)6, condensed at low temperatures on clean substrates in ultrahigh vacuum, has been investigated using ultraviolet and x-ray photoelectron spectroscopies together with molecular orbital (MO) calculations carried out using the self consistent field Xa-scattered wave method. Valence band spectra revealed three broad peaks centered at ~15.0, 7.5, and 4.5 eV below the Fermi level. The peaks were assigned, based upon computed MO results, to correspond primarily to C(2s) + H(1s), C(2p)+ H(1s), and Al(3p) + C(2p) bonding orbitals, respectively, in dimerized TMA. The wave functions of the upper MO levels corresponding to the 4.5-eV peak were predominantly composed of Al(3p) orbitals.
AB - The electronic structure of dimerized trimethylaluminum (TM A), Al2 (CH3)6, condensed at low temperatures on clean substrates in ultrahigh vacuum, has been investigated using ultraviolet and x-ray photoelectron spectroscopies together with molecular orbital (MO) calculations carried out using the self consistent field Xa-scattered wave method. Valence band spectra revealed three broad peaks centered at ~15.0, 7.5, and 4.5 eV below the Fermi level. The peaks were assigned, based upon computed MO results, to correspond primarily to C(2s) + H(1s), C(2p)+ H(1s), and Al(3p) + C(2p) bonding orbitals, respectively, in dimerized TMA. The wave functions of the upper MO levels corresponding to the 4.5-eV peak were predominantly composed of Al(3p) orbitals.
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U2 - 10.1116/1.575484
DO - 10.1116/1.575484
M3 - Article
AN - SCOPUS:84912942485
SN - 0734-2101
VL - 6
SP - 3115
EP - 3119
JO - Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
JF - Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
IS - 6
ER -