Deposition of (Zn,Mn)2SiO4 for plasma display panels using charged liquid cluster beam

M. Cich; K. Kim; H. Choi; S. T. Hwang

doi:10.1063/1.122396

Deposition of (Zn,Mn)₂SiO₄ for plasma display panels using charged liquid cluster beam

M. Cich, K. Kim, H. Choi, S. T. Hwang

Research output: Contribution to journal › Article › peer-review

Abstract

Films of manganese doped zinc silicate have been deposited using the charged liquid cluster beam technique. The deposition conditions were found to have a large impact on the morphology and photoluminescence intensity of these films. The photoluminescence intensity was maximized at a manganese content near δ=0.04 in (Zn_1-δMn_δ)₂SiO₄. No phases other than zinc silicate were detectable with manganese contents up to δ=0.08.

Original language	English (US)
Pages (from-to)	2116-2118
Number of pages	3
Journal	Applied Physics Letters
Volume	73
Issue number	15
DOIs	https://doi.org/10.1063/1.122396
State	Published - 1998

ASJC Scopus subject areas

Physics and Astronomy (miscellaneous)

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10.1063/1.122396

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title = "Deposition of (Zn,Mn)2SiO4 for plasma display panels using charged liquid cluster beam",

abstract = "Films of manganese doped zinc silicate have been deposited using the charged liquid cluster beam technique. The deposition conditions were found to have a large impact on the morphology and photoluminescence intensity of these films. The photoluminescence intensity was maximized at a manganese content near δ=0.04 in (Zn1-δMnδ)2SiO4. No phases other than zinc silicate were detectable with manganese contents up to δ=0.08.",

author = "M. Cich and K. Kim and H. Choi and Hwang, {S. T.}",

year = "1998",

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language = "English (US)",

volume = "73",

pages = "2116--2118",

journal = "Applied Physics Letters",

issn = "0003-6951",

publisher = "American Institute of Physics Publising LLC",

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AU - Cich, M.

AU - Kim, K.

AU - Choi, H.

AU - Hwang, S. T.

PY - 1998

Y1 - 1998

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AB - Films of manganese doped zinc silicate have been deposited using the charged liquid cluster beam technique. The deposition conditions were found to have a large impact on the morphology and photoluminescence intensity of these films. The photoluminescence intensity was maximized at a manganese content near δ=0.04 in (Zn1-δMnδ)2SiO4. No phases other than zinc silicate were detectable with manganese contents up to δ=0.08.

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