Deposition of zirconium oxide using atmospheric pressure plasma enhanced chemical vapor deposition with various precursors

Dhruval Patel, Lucia Bonova, Zachary Jeckell, D. Eitan Barlaz, Santanu Chaudhuri, Daniel V. Krogstad, David N. Ruzic

Research output: Contribution to journalArticlepeer-review

Original languageEnglish (US)
Article number138815
JournalThin Solid Films
StatePublished - Sep 1 2021


  • Atmospheric pressure plasma
  • Liquid assisted plasma enhanced chemical vapor deposition
  • Zirconia
  • Zirconium acetylacetonate
  • Zirconium oxynitrate hydrate
  • Zirconium tert-butoxide

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Surfaces and Interfaces
  • Surfaces, Coatings and Films
  • Metals and Alloys
  • Materials Chemistry

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