Deposition of YSZ thin films by atmospheric plasma-assisted pulsed laser ablation

Zihao Ouyang, Tae Seung Cho, David N Ruzic

Research output: Contribution to journalArticlepeer-review

Abstract

Yttria-stabilized zirconia (YSZ) thin films have been deposited on a nickel-based substrate by a laser-assisted plasma coating technique at atmospheric pressure. The substrate is heated by an atmospheric plasma torch to 800 ?C to form a thermally grown oxide layer and is increased to 1000 ?C during film deposition. The deposited films show columnar structures similar to films deposited in high-vacuum deposition methods. The microstructures of the deposited YSZ films have been examined by focused-ion beam and X-ray photoelectron spectroscopy.

Original languageEnglish (US)
Article number6294457
Pages (from-to)2850-2852
Number of pages3
JournalIEEE Transactions on Plasma Science
Volume40
Issue number11 PART1
DOIs
StatePublished - Sep 10 2012

Keywords

  • Atmospheric plasma
  • laser-assisted plasma coating at atmospheric pressure (LAPCAP)
  • thermal barrier coating
  • yttria-stabilized zirconia (YSZ) film

ASJC Scopus subject areas

  • Nuclear and High Energy Physics
  • Condensed Matter Physics

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