Keyphrases
Multicrystalline Silicon
100%
Microcrystalline
100%
Atomic Hydrogen
100%
Surface Mobility
100%
Film Growth
75%
Phase Formation
50%
Surface Hydrogen
50%
Reactive Magnetron Sputtering
50%
Hydrogen Coverage
50%
Hydrogen Flux
50%
Hydrogen Injection
50%
Structural-phase State
25%
Hot Filament Chemical Vapor Deposition (HFCVD)
25%
Low Dose Rate
25%
Surface Diffusion
25%
Large Flux
25%
Process Gases
25%
Surface Roughness
25%
Real Time Spectroscopic Ellipsometry
25%
Crystalline Phase
25%
Thermal Desorption
25%
Surface Reaction
25%
Molecular Hydrogen
25%
Silane
25%
Amorphous Region
25%
Dynamic Surface
25%
High Substrate Temperature
25%
Etching Mechanism
25%
Microscopic Mechanism
25%
Growth Areas
25%
Hydrogen Plasma
25%
Plasma Enhanced
25%
Hydrogenated Nanocrystalline Silicon
25%
Transformation Mechanism
25%
Low Substrate Temperature
25%
Argon-hydrogen
25%
Testing Mechanism
25%
Microcrystalline Silicon Thin Film
25%
Engineering
Microcrystalline
100%
Induced Surface
100%
Atomic Hydrogen
100%
Microcrystalline Silicon
100%
Phase Formation
50%
Magnetron
50%
Subsurface
50%
Substrate Temperature
50%
Hydrogen Flux
50%
Thin Films
25%
Chemical Vapor Deposition
25%
Vapor Deposition
25%
Larger Quantity
25%
Process Gas
25%
Crystalline Phase
25%
Molecular Hydrogen
25%
Amorphous Region
25%
Growth Surface
25%
Material Science
Amorphous Material
100%
Film Growth
100%
Microcrystalline Silicon
100%
Film
66%
Magnetron Sputtering
66%
Silicon
33%
Thin Films
33%
Crystalline Material
33%
Surface Diffusion
33%
Chemical Vapor Deposition
33%
Desorption
33%
Silane
33%
Surface Roughness
33%
Surface Reaction
33%
Chemical Engineering
Magnetron Sputtering
100%
Thermal Desorption
50%
Surface Diffusion
50%
Vapor Deposition
50%
Chemical Vapor Deposition
50%
Silane
50%
Spectroscopic Ellipsometry
50%