Deposition of epitaxial α-Fe₂O₃ layers for exchange bias studies by reactive dc magnetron sputtering

We describe the deposition and characterization of epitaxial thin films of the iron oxide haematite (α-Fe₂O₃), a promising candidate for fundamental studies of exchange anisotropy as well as for high thermal stability applications. The films were deposited by reactive dc magnetron sputtering. Structural characterization was by large-angle X-ray diffraction and grazing-incidence reflectivity (with the scattering vector normal to the sample plane), in-plane grazing-incidence diffraction (scattering vector in the sample plane) and reflection high-energy electron diffraction. Optimized sputtering conditions result in good epitaxy both in the growth direction and in the plane, as well as very smooth surfaces.