TY - JOUR
T1 - Deposited metal films for imaging in scanning tunneling microscopy
AU - Mazur, Ursula
AU - Fried, Glenn
AU - Hipps, K. W.
N1 - Funding Information:
We acknowledge the National Science Foundation and the Division of Chemistry for their support in the form of Grant CHE-8805612. We also thank Leann Rayfuse for her assistancew ith some of the deposition experiments.
PY - 1991/2/2
Y1 - 1991/2/2
N2 - The use of Au, Au/Pd, and W deposited films for imaging underlying structure, and for forming a smooth conductive base for imaging adiayers, is explored. Films of thickness less than 20 nm are studied. DC sputtering, ion beam deposition, and thermal (resistive) deposition are contrasted. All studies are conducted with the substrate held at room temperature or below. It is found that ion beam deposition gives significantly flatter films. In the case of ionic substrates held at room temperature during deposition, DC sputtered Au films are the only films that do not spontaneously crack or blister within a period of a few hours.
AB - The use of Au, Au/Pd, and W deposited films for imaging underlying structure, and for forming a smooth conductive base for imaging adiayers, is explored. Films of thickness less than 20 nm are studied. DC sputtering, ion beam deposition, and thermal (resistive) deposition are contrasted. All studies are conducted with the substrate held at room temperature or below. It is found that ion beam deposition gives significantly flatter films. In the case of ionic substrates held at room temperature during deposition, DC sputtered Au films are the only films that do not spontaneously crack or blister within a period of a few hours.
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U2 - 10.1016/0039-6028(91)90356-W
DO - 10.1016/0039-6028(91)90356-W
M3 - Article
AN - SCOPUS:0026412759
VL - 243
SP - 179
EP - 192
JO - Surface Science
JF - Surface Science
SN - 0039-6028
IS - 1-3
ER -