Deposited metal films for imaging in scanning tunneling microscopy

Ursula Mazur, Glenn Fried, K. W. Hipps

Research output: Contribution to journalArticlepeer-review


The use of Au, Au/Pd, and W deposited films for imaging underlying structure, and for forming a smooth conductive base for imaging adiayers, is explored. Films of thickness less than 20 nm are studied. DC sputtering, ion beam deposition, and thermal (resistive) deposition are contrasted. All studies are conducted with the substrate held at room temperature or below. It is found that ion beam deposition gives significantly flatter films. In the case of ionic substrates held at room temperature during deposition, DC sputtered Au films are the only films that do not spontaneously crack or blister within a period of a few hours.

Original languageEnglish (US)
Pages (from-to)179-192
Number of pages14
JournalSurface Science
Issue number1-3
StatePublished - Feb 2 1991
Externally publishedYes

ASJC Scopus subject areas

  • Condensed Matter Physics
  • Surfaces and Interfaces
  • Surfaces, Coatings and Films
  • Materials Chemistry


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