Degradation kinetics of hydrogenated amorphous silicon: The effect of embedded microcrystallites

Yoram Lubianiker, J. David Cohen, Hyun Chul Jin, John R. Abelson

Research output: Contribution to journalConference article

Abstract

We have studied the degradation kinetics of undoped a-Si:H films which contain a significant fraction of silicon microcrystallites. The degradation rate is found to be exceptionally slow in the first stage of degradation, then the defect density follows the `normal' t1/3 rate and finally saturates. We present a model which relates this abnormal kinetics to the microcrystallites which are embedded in the amorphous matrix.

Original languageEnglish (US)
Pages (from-to)729-734
Number of pages6
JournalMaterials Research Society Symposium - Proceedings
Volume507
StatePublished - Jan 1 1999
Externally publishedYes
EventProceedings of the 1998 MRS Spring Meeting - San Francisco, CA, USA
Duration: Apr 13 1998Apr 17 1998

ASJC Scopus subject areas

  • Materials Science(all)
  • Condensed Matter Physics
  • Mechanics of Materials
  • Mechanical Engineering

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