Defect recovery processes in Cr-B binary and Cr-Al-B MAB phases: structure-dependent radiation tolerance

Jun Young Kim, Hongliang Zhang, Ranran Su, Jianqi Xi, Shuguang Wei, Peter Richardson, Longfei Liu, Erich Kisi, John H. Perepezko, Izabela Szlufarska

Research output: Contribution to journalArticlepeer-review

Abstract

We have investigated the radiation tolerance of Cr-B binaries and Cr-Al-B ternary MAB phases using a combination of ab initio calculations and experiments. One key discovery is that Cr3AlB4 has excellent resistance to radiation-induced amorphization, and therefore it is a promising material for applications in extreme environments. We also demonstrate that both the type of B network and the presence of Al layer in the structure have important implications for defect kinetics. We find that the order of the tolerance to radiation-induced amorphization is, from high to low, CrB, Cr3AlB4, Cr3B4, Cr4AlB6, and Cr2AlB2 at 150 °C and 0.5 dpa, and Cr3AlB4, CrB, Cr3B4, Cr4AlB6, and Cr2AlB2 at 300 °C and 1.0 dpa. The results are explained in terms of defect properties determined from ab initio calculations.

Original languageEnglish (US)
Article number118099
JournalActa Materialia
Volume235
DOIs
StatePublished - Aug 15 2022
Externally publishedYes

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Ceramics and Composites
  • Polymers and Plastics
  • Metals and Alloys

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