Defect production in copper and silver by light energetic ions

R. S. Averback, R. Benedek, K. L. Merkle

Research output: Contribution to journalArticlepeer-review


Measurements have been made of the change in residual electrical resistivity in thin-film specimens of Cu and Ag induced by light-ion irradiations (H,D,3He, 4He) below 10 K in the energy range 15-40 keV. The number of Frenkel pairs created per incident ion was deduced and compared with theoretical predictions. The efficiency factor (ratio of experimental to theoretical value) was found to decrease from ∼1 to 0.7 (0.9 to 0.65) for Cu (Ag) as the recoil spectrum was shifted to higher energies by increasing the projectile mass and/or energy.

Original languageEnglish (US)
Pages (from-to)455-457
Number of pages3
JournalApplied Physics Letters
Issue number9
StatePublished - 1977
Externally publishedYes

ASJC Scopus subject areas

  • Physics and Astronomy (miscellaneous)


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