A new soft-lithographic method for micropatterning polymeric resists, Decal Transfer Microlithography (DTM), is described. This technique is based on the transfer of elastomeric decal patterns via the engineered adhesion and release properties of a compliant poly(dimethylsiloxane) (PDMS) patterning tool. An important feature of the DTM method is the exceptionally broad spectrum of design rules that it embraces. This procedure is capable of transferring micron to submicron-sized features with high fidelity over large substrate areas and potentially simplifies to a significant degree the requirements for effecting multiple levels of registration. The DTM method offers some potential advantages over other soft-lithographic patterning methods in that it is amenable to transferring resist patterns with both open and closed forms, negative and positive image contrasts, and does so for a wide variety of aspect ratios and a significant range of pattern pitches that can be accommodated without degradation due to mechanical distortions of the pattern transfer tool. The most significant advance embodied in the DTM method, however, is that it offers useful new capabilities for the design and fabrication of advanced planar and 3D microfluidic assemblies and microreactors.
|Original language||English (US)|
|Number of pages||14|
|Journal||Journal of the American Chemical Society|
|State||Published - Nov 13 2002|
ASJC Scopus subject areas
- Colloid and Surface Chemistry