@inproceedings{0b71561aad914a80b10ab8180e8861e2,
title = "Debris measurement at the intermediate focus of a laser-assisted discharge-produced plasma light source",
abstract = "For extreme ultraviolet light lithography to be a viable process for the future development of computer chips, it is necessary that clean photons are produced at the intermediate focus (IF). To measure the flux at the IF, the Center for Plasma-Material Interactiosn (CPMI) at the University of Illinois at Urbana-Champaign has developed a Sn IF flux emission detector (SNIFFED) apparatus that is capable of measuring charged and neutral particle flux at the IF. Results will be presented that diagnose debris produced at the IF, as well as methods by which this debris can be mitigated. Advanced Materials Research Center, AMRC, International SEMATECH Manufacturing Initiative, and ISMI are servicemarks of SEMATECH, Inc. SEMATECH, and the SEMATECH logo are registered servicemarks of SEMATECH, Inc. All other servicemarks and trademarks are the property of their respective owners.",
keywords = "CPMI, EUV, LADPP, debris mitigation, debris transport, intermediate focus, sniffed",
author = "J. Sporre and V. Surla and Neumann, {M. J.} and Ruzic, {David N} and L. Ren and F. Goodwin",
year = "2010",
month = jun,
day = "17",
doi = "10.1117/12.846590",
language = "English (US)",
isbn = "9780819480507",
series = "Proceedings of SPIE - The International Society for Optical Engineering",
booktitle = "Extreme Ultraviolet (EUV) Lithography",
note = "Extreme Ultraviolet (EUV) Lithography ; Conference date: 22-02-2010 Through 25-02-2010",
}