Debris measurement at the intermediate focus of a laser-assisted discharge-produced plasma light source

J. Sporre, V. Surla, M. J. Neumann, David N Ruzic, L. Ren, F. Goodwin

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Abstract

For extreme ultraviolet light lithography to be a viable process for the future development of computer chips, it is necessary that clean photons are produced at the intermediate focus (IF). To measure the flux at the IF, the Center for Plasma-Material Interactiosn (CPMI) at the University of Illinois at Urbana-Champaign has developed a Sn IF flux emission detector (SNIFFED) apparatus that is capable of measuring charged and neutral particle flux at the IF. Results will be presented that diagnose debris produced at the IF, as well as methods by which this debris can be mitigated. Advanced Materials Research Center, AMRC, International SEMATECH Manufacturing Initiative, and ISMI are servicemarks of SEMATECH, Inc. SEMATECH, and the SEMATECH logo are registered servicemarks of SEMATECH, Inc. All other servicemarks and trademarks are the property of their respective owners.

Original languageEnglish (US)
Title of host publicationExtreme Ultraviolet (EUV) Lithography
DOIs
StatePublished - Jun 17 2010
EventExtreme Ultraviolet (EUV) Lithography - San Jose, CA, United States
Duration: Feb 22 2010Feb 25 2010

Publication series

NameProceedings of SPIE - The International Society for Optical Engineering
Volume7636
ISSN (Print)0277-786X

Other

OtherExtreme Ultraviolet (EUV) Lithography
CountryUnited States
CitySan Jose, CA
Period2/22/102/25/10

Fingerprint

debris
Debris
plasma jets
Light sources
light sources
Plasma
Laser
Fluxes
Plasmas
Lasers
lasers
Trademarks
Lithography
Ultraviolet
Photon
Extremes
Chip
Photons
Manufacturing
Detector

Keywords

  • CPMI
  • EUV
  • LADPP
  • debris mitigation
  • debris transport
  • intermediate focus
  • sniffed

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Condensed Matter Physics
  • Computer Science Applications
  • Applied Mathematics
  • Electrical and Electronic Engineering

Cite this

Sporre, J., Surla, V., Neumann, M. J., Ruzic, D. N., Ren, L., & Goodwin, F. (2010). Debris measurement at the intermediate focus of a laser-assisted discharge-produced plasma light source. In Extreme Ultraviolet (EUV) Lithography [763611] (Proceedings of SPIE - The International Society for Optical Engineering; Vol. 7636). https://doi.org/10.1117/12.846590

Debris measurement at the intermediate focus of a laser-assisted discharge-produced plasma light source. / Sporre, J.; Surla, V.; Neumann, M. J.; Ruzic, David N; Ren, L.; Goodwin, F.

Extreme Ultraviolet (EUV) Lithography. 2010. 763611 (Proceedings of SPIE - The International Society for Optical Engineering; Vol. 7636).

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Sporre, J, Surla, V, Neumann, MJ, Ruzic, DN, Ren, L & Goodwin, F 2010, Debris measurement at the intermediate focus of a laser-assisted discharge-produced plasma light source. in Extreme Ultraviolet (EUV) Lithography., 763611, Proceedings of SPIE - The International Society for Optical Engineering, vol. 7636, Extreme Ultraviolet (EUV) Lithography, San Jose, CA, United States, 2/22/10. https://doi.org/10.1117/12.846590
Sporre J, Surla V, Neumann MJ, Ruzic DN, Ren L, Goodwin F. Debris measurement at the intermediate focus of a laser-assisted discharge-produced plasma light source. In Extreme Ultraviolet (EUV) Lithography. 2010. 763611. (Proceedings of SPIE - The International Society for Optical Engineering). https://doi.org/10.1117/12.846590
Sporre, J. ; Surla, V. ; Neumann, M. J. ; Ruzic, David N ; Ren, L. ; Goodwin, F. / Debris measurement at the intermediate focus of a laser-assisted discharge-produced plasma light source. Extreme Ultraviolet (EUV) Lithography. 2010. (Proceedings of SPIE - The International Society for Optical Engineering).
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