Debris measurement at the intermediate focus of a laser-assisted discharge-produced plasma light source

J. Sporre, V. Surla, M. J. Neumann, David N Ruzic, L. Ren, F. Goodwin

Research output: Chapter in Book/Report/Conference proceedingConference contribution


For extreme ultraviolet light lithography to be a viable process for the future development of computer chips, it is necessary that clean photons are produced at the intermediate focus (IF). To measure the flux at the IF, the Center for Plasma-Material Interactiosn (CPMI) at the University of Illinois at Urbana-Champaign has developed a Sn IF flux emission detector (SNIFFED) apparatus that is capable of measuring charged and neutral particle flux at the IF. Results will be presented that diagnose debris produced at the IF, as well as methods by which this debris can be mitigated. Advanced Materials Research Center, AMRC, International SEMATECH Manufacturing Initiative, and ISMI are servicemarks of SEMATECH, Inc. SEMATECH, and the SEMATECH logo are registered servicemarks of SEMATECH, Inc. All other servicemarks and trademarks are the property of their respective owners.

Original languageEnglish (US)
Title of host publicationExtreme Ultraviolet (EUV) Lithography
StatePublished - Jun 17 2010
EventExtreme Ultraviolet (EUV) Lithography - San Jose, CA, United States
Duration: Feb 22 2010Feb 25 2010

Publication series

NameProceedings of SPIE - The International Society for Optical Engineering
ISSN (Print)0277-786X


OtherExtreme Ultraviolet (EUV) Lithography
Country/TerritoryUnited States
CitySan Jose, CA


  • CPMI
  • EUV
  • debris mitigation
  • debris transport
  • intermediate focus
  • sniffed

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Condensed Matter Physics
  • Computer Science Applications
  • Applied Mathematics
  • Electrical and Electronic Engineering


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