TY - JOUR
T1 - CTM-SRAF
T2 - Continuous Transmission Mask-Based Constraint-Aware Subresolution Assist Feature Generation
AU - Yu, Ziyang
AU - Liao, Peiyu
AU - Ma, Yuzhe
AU - Yu, Bei
AU - Wong, Martin D.F.
N1 - This work was supported in part by the Research Grants Council of Hong Kong, SAR, under Project CUHK14208021. This article was recommended by Associate Editor L. Behjat
PY - 2023/10/1
Y1 - 2023/10/1
N2 - In the lithography process, subresolution assist features (SRAFs), as an essential resolution enhancement technique (RET), is applied to improve the pattern fidelity and enlarge the process window. In this article, we propose a robust constraint-aware SRAF generation method based on continuous transmission mask (CTM). The intensity distribution on the CTM is extracted to guide the SRAF generation. The SRAF insertion also honors the design rules, which is formulated as integer programming with quadratic constraints and solved by a fast yet efficient algorithm. A fast probe-based SRAF evolution method is proposed to determine the shapes of SRAFs. The effectiveness and efficiency are demonstrated based on the experimental results.
AB - In the lithography process, subresolution assist features (SRAFs), as an essential resolution enhancement technique (RET), is applied to improve the pattern fidelity and enlarge the process window. In this article, we propose a robust constraint-aware SRAF generation method based on continuous transmission mask (CTM). The intensity distribution on the CTM is extracted to guide the SRAF generation. The SRAF insertion also honors the design rules, which is formulated as integer programming with quadratic constraints and solved by a fast yet efficient algorithm. A fast probe-based SRAF evolution method is proposed to determine the shapes of SRAFs. The effectiveness and efficiency are demonstrated based on the experimental results.
KW - Continuous transmission mask (CTM)
KW - design for manufacturability
KW - subresolution assist feature (SRAF) generation
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U2 - 10.1109/TCAD.2023.3239559
DO - 10.1109/TCAD.2023.3239559
M3 - Article
AN - SCOPUS:85147292303
SN - 0278-0070
VL - 42
SP - 3402
EP - 3411
JO - IEEE Transactions on Computer-Aided Design of Integrated Circuits and Systems
JF - IEEE Transactions on Computer-Aided Design of Integrated Circuits and Systems
IS - 10
ER -