CORRELATION OF RUTHERFORD BACKSCATTERING AND ELECTRICAL MEASUREMENTS ON Si IMPLANTED InP FOLLOWING RAPID THERMAL AND FURNACE ANNEALING.

G. Bahir; J. L. Merz; J. R. Abelson; T. W. Sigmon

doi:10.1557/proc-45-297

CORRELATION OF RUTHERFORD BACKSCATTERING AND ELECTRICAL MEASUREMENTS ON Si IMPLANTED InP FOLLOWING RAPID THERMAL AND FURNACE ANNEALING.

G. Bahir, J. L. Merz, J. R. Abelson, T. W. Sigmon

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution

Original language	English (US)
Title of host publication	Materials Research Society Symposia Proceedings
Publisher	Materials Research Soc
Pages	297-302
Number of pages	6
ISBN (Print)	0931837103, 9780931837104
DOIs	https://doi.org/10.1557/proc-45-297
State	Published - 1985
Externally published	Yes

Publication series

Name	Materials Research Society Symposia Proceedings
Volume	45
ISSN (Print)	0272-9172

ASJC Scopus subject areas

Materials Science(all)
Condensed Matter Physics
Mechanics of Materials
Mechanical Engineering

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10.1557/proc-45-297

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Bahir, G., Merz, J. L., Abelson, J. R., & Sigmon, T. W. (1985). CORRELATION OF RUTHERFORD BACKSCATTERING AND ELECTRICAL MEASUREMENTS ON Si IMPLANTED InP FOLLOWING RAPID THERMAL AND FURNACE ANNEALING. In Materials Research Society Symposia Proceedings (pp. 297-302). (Materials Research Society Symposia Proceedings; Vol. 45). Materials Research Soc. https://doi.org/10.1557/proc-45-297

CORRELATION OF RUTHERFORD BACKSCATTERING AND ELECTRICAL MEASUREMENTS ON Si IMPLANTED InP FOLLOWING RAPID THERMAL AND FURNACE ANNEALING. / Bahir, G.; Merz, J. L.; Abelson, J. R.; Sigmon, T. W.

Materials Research Society Symposia Proceedings. Materials Research Soc, 1985. p. 297-302 (Materials Research Society Symposia Proceedings; Vol. 45).

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution

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