CORRELATION OF RUTHERFORD BACKSCATTERING AND ELECTRICAL MEASUREMENTS ON Si IMPLANTED InP FOLLOWING RAPID THERMAL AND FURNACE ANNEALING.

G. Bahir, J. L. Merz, J. R. Abelson, T. W. Sigmon

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Original languageEnglish (US)
Title of host publicationMaterials Research Society Symposia Proceedings
PublisherMaterials Research Soc
Pages297-302
Number of pages6
ISBN (Print)0931837103, 9780931837104
DOIs
StatePublished - 1985
Externally publishedYes

Publication series

NameMaterials Research Society Symposia Proceedings
Volume45
ISSN (Print)0272-9172

ASJC Scopus subject areas

  • Materials Science(all)
  • Condensed Matter Physics
  • Mechanics of Materials
  • Mechanical Engineering

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