Controlling impurity-induced disordering via mask strain for high-performance vertical-cavity surface-emitting lasers

Patrick Su, Thomas O’Brien, Fu Chen Hsiao, John M. Dallesasse

Research output: Contribution to conferencePaperpeer-review

Abstract

Impurity-induced disordering (IID) in vertical-cavity surface-emitting lasers (VCSELs) has been shown to provide enhanced performance, such as achieving single fundamental-mode operation with higher output powers when compared to conventional VCSELs. This work presents the performance of oxide-confined, λ ~ 850 nm, VCSELs fabricated with varying IID aperture sizes which are characterized for maximum single-fundamental-mode output power. The electrical and optical performance of these devices are shown in comparison to traditional oxide-confined VCSELs and the optimal IID aperture size is experimentally validated. Control of the lateral-to-vertical (L/V) IID aperture profile is then demonstrated through engineering the strain induced by the IID diffusion mask. This extensive control over the IID aperture enables improved, manufacturable, IID VCSEL designs.

Original languageEnglish (US)
StatePublished - 2018
Event2018 International Conference on Compound Semiconductor Manufacturing Technology, CS MANTECH 2018 - Austin, United States
Duration: May 7 2018May 10 2018

Other

Other2018 International Conference on Compound Semiconductor Manufacturing Technology, CS MANTECH 2018
Country/TerritoryUnited States
CityAustin
Period5/7/185/10/18

Keywords

  • Impurity-induced disordering
  • Single-fundamental-mode VCSELs
  • VCSEL aperture control
  • Vertical-cavity surface-emitting lasers

ASJC Scopus subject areas

  • Hardware and Architecture
  • Electrical and Electronic Engineering

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