Contamination concerns at the intermediate focus of an extreme ultraviolet light source

David N Ruzic, John Sporre, Dan Elg, Davide Curreli

Research output: Chapter in Book/Report/Conference proceedingConference contribution


The emission of species that can chemically or physically alter the surface of post intermediate-focus optics will increase the cost of ownership of such an EUV lithography tool past the point of cost effectiveness. To address this concern, the Center for Plasma-Material Interactions has developed the Sn Intermediate Focus Flux Emission Detector (SNIFFED). The effects of increasing buffer gas, increasing pressure, and chosen buffer gas species will be presented. Furthermore the presence of a secondary plasma, generated by EUV light will be analyzed and exposed as a potential issue in the strive for a contaminant free intermediate focus.

Original languageEnglish (US)
Title of host publicationExtreme Ultraviolet (EUV) Lithography IV
StatePublished - 2013
EventExtreme Ultraviolet (EUV) Lithography IV - San Jose, CA, United States
Duration: Feb 25 2013Feb 28 2013

Publication series

NameProceedings of SPIE - The International Society for Optical Engineering
ISSN (Print)0277-786X


OtherExtreme Ultraviolet (EUV) Lithography IV
Country/TerritoryUnited States
CitySan Jose, CA


  • Collector optic
  • Debris mitigation
  • Debris transport
  • EUV
  • Intermediate focus
  • Sniffed
  • Tin

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Condensed Matter Physics
  • Computer Science Applications
  • Applied Mathematics
  • Electrical and Electronic Engineering


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