@inproceedings{6dd254dd51c2435bb0c42c7cfc0b6d20,
title = "Contamination concerns at the intermediate focus of an extreme ultraviolet light source",
abstract = "The emission of species that can chemically or physically alter the surface of post intermediate-focus optics will increase the cost of ownership of such an EUV lithography tool past the point of cost effectiveness. To address this concern, the Center for Plasma-Material Interactions has developed the Sn Intermediate Focus Flux Emission Detector (SNIFFED). The effects of increasing buffer gas, increasing pressure, and chosen buffer gas species will be presented. Furthermore the presence of a secondary plasma, generated by EUV light will be analyzed and exposed as a potential issue in the strive for a contaminant free intermediate focus.",
keywords = "Collector optic, Debris mitigation, Debris transport, EUV, Intermediate focus, Sniffed, Tin",
author = "Ruzic, {David N} and John Sporre and Dan Elg and Davide Curreli",
year = "2013",
month = jun,
day = "5",
doi = "10.1117/12.2011612",
language = "English (US)",
isbn = "9780819494610",
series = "Proceedings of SPIE - The International Society for Optical Engineering",
booktitle = "Extreme Ultraviolet (EUV) Lithography IV",
note = "Extreme Ultraviolet (EUV) Lithography IV ; Conference date: 25-02-2013 Through 28-02-2013",
}