Contact layer decomposition to enable DSA with multi-patterning technique for standard cell based layout

Keyphrases

• Directed Self-assembly 100%
• Pattern-based Approach 100%
• Contact Layer 100%
• Standard Cell-based 100%
• Cellular Layout 100%
• Multiple Patterning 100%
• Layer Decomposition 100%
• High-throughput 16%
• Manufacturing Process 16%
• Polynomial Time 16%
• Heuristic Approach 16%
• Complementary Approach 16%
• Decomposition Problem 16%
• Minimum Cost 16%
• Suboptimal Solutions 16%
• Cost-effective Solution 16%
• Lithography Technology 16%
• Double Patterning 16%
• Guide Template 16%
• 7nm Node 16%
• Standard Cell Placement 16%
• Edge Placement Error 16%
• Multiple Patterning Lithography 16%
• Template Generation 16%
• Complementary Lithography 16%
• Advanced Nodes 16%
• EUV Patterning 16%
• 7-nm Technology 16%

Engineering

• Lithography 100%
• Patterning Technique 100%
• Nodes 66%
• Manufacturing Process 33%
• Patterning Process 33%
• Effective Solution 33%
• Polynomial Time 33%

Material Science

• Self Assembly 100%
• Lithography 50%
• Electronic Circuit 16%