Contact layer decomposition to enable DSA with multi-patterning technique for standard cell based layout

Zigang Xiao, Chun Xun Lin, Martin D.F. Wong, Hongbo Zhang

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Abstract

Multiple patterning lithography has been widely adopted for today's circuit manufacturing. However, increasing the number of masks will make the manufacturing process more expensive. More importantly, towards 7 nm technology node, the accumulated overlay in multiple patterning will cause unacceptable edge placement error (EPE). Recently, directed self-assembly (DSA) has been shown to be an effective lithography technology that can pattern contact/via/cuts with high throughput and low cost. DSA is currently aiming at 7 nm technology, where the guiding template generation needs either double patterning EUV or multiple patterning DUV process. By incorporating DSA into the multiple patterning process, it is possible to reduce the number of masks and achieve a cost effective solution. In this paper, we study the decomposition problem for contact layer in row-based standard cell layout with DSA-MP complementary lithography. We explore several heuristic-based approaches, and propose an algorithm that decomposes a standard cell row optimally in polynomial-time. Our experiments show that our algorithm guarantees to find a minimum cost solution if one exists, while the heuristic cannot or only finds a sub-optimal solution. Our results show that the DSA-MP complementary approach is very promising for the future advanced nodes.

Original languageEnglish (US)
Title of host publication2016 21st Asia and South Pacific Design Automation Conference, ASP-DAC 2016
PublisherInstitute of Electrical and Electronics Engineers Inc.
Pages95-102
Number of pages8
ISBN (Electronic)9781467395694
DOIs
StatePublished - Mar 7 2016
Event21st Asia and South Pacific Design Automation Conference, ASP-DAC 2016 - Macao, Macao
Duration: Jan 25 2016Jan 28 2016

Publication series

NameProceedings of the Asia and South Pacific Design Automation Conference, ASP-DAC
Volume25-28-January-2016

Other

Other21st Asia and South Pacific Design Automation Conference, ASP-DAC 2016
CountryMacao
CityMacao
Period1/25/161/28/16

ASJC Scopus subject areas

  • Electrical and Electronic Engineering
  • Computer Science Applications
  • Computer Graphics and Computer-Aided Design

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    Xiao, Z., Lin, C. X., Wong, M. D. F., & Zhang, H. (2016). Contact layer decomposition to enable DSA with multi-patterning technique for standard cell based layout. In 2016 21st Asia and South Pacific Design Automation Conference, ASP-DAC 2016 (pp. 95-102). [7427995] (Proceedings of the Asia and South Pacific Design Automation Conference, ASP-DAC; Vol. 25-28-January-2016). Institute of Electrical and Electronics Engineers Inc.. https://doi.org/10.1109/ASPDAC.2016.7427995