Conformal dielectric overlayers for engineering dispersion and effective nonlinearity of silicon nanophotonic wires

Xiaoping Liu, William M.J. Green, Xiaogang Chen, I. Wei Hsieh, Jerry I. Dadap, Yurii A Vlasov, Richard M. Osgood

Research output: Contribution to journalArticlepeer-review

Abstract

We introduce and study numerically a method for dispersion engineering of Si nanophotonic wires using a thin conformal silicon nitride film deposited around the Si core. Simulations show that this approach may be used to achieve the dispersion characteristics required for broadband, phase-matched, four-wave mixing processes, while simultaneously maintaining strong modal confinement within the Si core for high effective nonlinearity.

Original languageEnglish (US)
Pages (from-to)2889-2891
Number of pages3
JournalOptics Letters
Volume33
Issue number24
DOIs
StatePublished - Dec 15 2008
Externally publishedYes

ASJC Scopus subject areas

  • Atomic and Molecular Physics, and Optics

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