Conformal dielectric overlayers for engineering dispersion and effective nonlinearity of silicon nanophotonic wires

Xiaoping Liu, William M.J. Green, Xiaogang Chen, I. Wei Hsieh, Jerry I. Dadap, Yurii A. Vlasov, Richard M. Osgood

Research output: Contribution to journalArticlepeer-review

Abstract

We introduce and study numerically a method for dispersion engineering of Si nanophotonic wires using a thin conformal silicon nitride film deposited around the Si core. Simulations show that this approach may be used to achieve the dispersion characteristics required for broadband, phase-matched, four-wave mixing processes, while simultaneously maintaining strong modal confinement within the Si core for high effective nonlinearity.

Original languageEnglish (US)
Pages (from-to)2889-2891
Number of pages3
JournalOptics Letters
Volume33
Issue number24
DOIs
StatePublished - Dec 15 2008
Externally publishedYes

ASJC Scopus subject areas

  • Atomic and Molecular Physics, and Optics

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