Confinement of microplasmas in silicon channels with widths as Small as < 5; μm

Rare gas microplasmas confined in one dimension to < 5 μm have been realized. Microchannels having cross sections in the form of a V-groove were fabricated in Si and microplasmas produced within the channels by means of a dielectric barrier structure in which electrodes are flush with the microgroove rim along the entire length of the channel. Stable uniform glows are generated in channels ∼5 and 50 μm in width when a He/Ar or He/Ne gas mixture at a total pressure > 400 torr is introduced to the channel. The requirement for Penning gas mixtures in the narrowest channel appears to be associated with an accelerated electron loss rate.