Composition analysis of semiconductor quantum wells by energy filtered convergent-beam electron diffraction

D. Jacob, J. M. Zuo, A. Lefebvre, Y. Cordier

Research output: Contribution to journalArticle

Abstract

We show how energy-filtered convergent-beam electron diffraction (EFCBED) patterns can be used to determine the chemical composition of buried semiconductor strained quantum wells. Our method is based on a quantitative analysis of the intensities of high-order Bragg lines in the transmitted disc of EFCBED patterns taken from plan-view samples. This analysis makes it possible to determine the displacement vector R introduced between the top and bottom parts of the matrix by the deformation of the quantum well and consequently to determine its composition. This is illustrated in the case of an InxGa1-xAs quantum well buried in a GaAs matrix. A detailed analysis of the effect of experimental parameters on Bragg lines intensity is performed. In particular, the importance of the choice of the diffraction vector is pointed out. The relative uncertainty on the measurement of the indium content x is found to be lower than 5% and a possible occurrence of slight compositional fluctuations in the (0 0 1) growth plane is pointed out.

Original languageEnglish (US)
Pages (from-to)358-366
Number of pages9
JournalUltramicroscopy
Volume108
Issue number4
DOIs
StatePublished - Mar 2008

Keywords

  • Composition analysis
  • Convergent-beam electron diffraction
  • Semiconductor quantum wells
  • Transmission electron microscopy

ASJC Scopus subject areas

  • Materials Science(all)
  • Instrumentation

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