Complex three-dimensional conformal surfaces formed by atomic layer deposition: Computation and experimental verification

Atomic layer deposition in complex three-dimensional porous materials is useful for manipulating properties such as pore size, pore connectivity, density, and dielectric constant. In order to calculate a material's properties it is necessary to determine the material distribution. A generally applicable algorithm for determining the material distribution and pore connectivity is presented. Calculations using the algorithm compared favorably with experimental results for the important case of infilling dielectric material into three-dimensional photonic crystal templates.