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Column IIIA metal film deposition by dissociative photoionization of metal halide vapors
D. B. Geohegan,
J. G. Eden
Electrical and Computer Engineering
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Keyphrases
Indium
100%
Metal Halides
100%
Metal Film Deposition
100%
Dissociative Photoionization
100%
Stainless Steel
50%
Argon
50%
Thallium
50%
Fluoride
50%
Excimer Laser
50%
Similar Processes
50%
Xenon Lamp
50%
Uniform Electric Field
50%
Nickel-copper
50%
High-pressure Xenon
50%
Metal Iodates
50%
Thallium Halides
50%
Nickel Silver
50%
Material Science
Film
100%
Film Deposition
100%
Metal Film
100%
Metal Halide
100%
Indium
66%
Thallium
66%
Silver
33%
Stainless Steel
33%
Xenon
33%
Lamp
33%
Chemistry
Liquid Film
100%
Halide
100%
Dissociative Photoionization
100%
Indium
50%
Electric Field
25%
Silver
25%
Stainless Steel
25%
Xenon
25%
Argon
25%
Excimer
25%
Chemical Engineering
Indium
100%
Metal Halides
100%