Collapse of stamps for soft lithography due to interfacial adhesion

K. J. Hsia, Y. Huang, E. Menard, J. U. Park, W. Zhou, J. Rogers, J. M. Fulton

Research output: Contribution to journalArticlepeer-review


Collapse of elastomeric elements used for pattern transfer in soft lithography is studied through experimental measurements and theoretical modeling. The objective is to identify the driving force for such collapse. Two potential driving forces, the self-weight of the stamp and the interfacial adhesion, are investigated. An idealized configuration of periodic rectangular grooves and flat punches is considered. Experimental observations demonstrate that groove collapse occurs regardless of whether the gravitational force promotes or suppresses such collapse, indicating that self-weight is not the driving force. On the other hand, model predictions based on the postulation that interfacial adhesion is the driving force exhibit excellent agreement with the experimentally measured collapse behavior. The interfacial adhesion energy is also evaluated by matching an adhesion parameter in the model with the experimental data.

Original languageEnglish (US)
Article number154106
Pages (from-to)1-3
Number of pages3
JournalApplied Physics Letters
Issue number15
StatePublished - 2005

ASJC Scopus subject areas

  • Physics and Astronomy (miscellaneous)


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