CMOS-Compatible Catalyst for MacEtch: Titanium Nitride-Assisted Chemical Etching in Vapor phase for High Aspect Ratio Silicon Nanostructures

Jeong Dong Kim, Munho Kim, Clarence Chan, Nerissa Draeger, James J. Coleman, Xiuling Li

Research output: Contribution to journal › Article › peer-review

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Chemical Compounds

Engineering & Materials Science