Abstract
Described herein is an apparatus and a method for producing atom clusters based on a gas discharge within a hollow cathode. The hollow cathode includes one or more walls. The one or more walls define a sputtering chamber within the hollow cathode and include a material to be sputtered. A hollow anode is positioned at an end of the sputtering chamber, and atom clusters are formed when a gas discharge is generated between the hollow anode and the hollow cathode.
| Original language | English (US) |
|---|---|
| U.S. patent number | 7951276 |
| Filing date | 6/7/07 |
| State | Published - May 31 2011 |