Chromium catalysed silicon nitridation

C. G. Cofer, Jennifer A Lewis

Research output: Contribution to journalArticlepeer-review

Abstract

Silicon powder compacts were fabricated with various amounts of chromium (0-5 at %) deposited onto the surface of the silicon powder by a solution-deposition process. These compacts were heated to several maximum temperatures in the range 1100-1250‡C in a flowing 10% H2/90% N2 atmosphere to evaluate the effect of the chromium content on the silicon nitridation. It was observed that silicon compacts containing 5 at % Cr were fully nitrided in approximately 3 h at 1150‡C, while less than 8% nitridation was achieved for pure-silicon compacts (with 0 at % Cr) compacts under the same conditions. Single-crystal silicon wafers with a 50 nm chromium layer were also nitrided; this provided a planar geometry, which facilitated our study of the catalysis mechanism. The rate-controlling process was shown to be first order, which may be indicative of a nucleation-and-growth mechanism, which is commonly observed for α-silicon-nitride formation. This work demonstrates the feasibility of producing reaction-bonded silicon nitride at low temperatures using chromium catalysis, and it indicates the potential for fabricating fibre-reinforced silicon-nitride composites containing thermally sensitive fibres.

Original languageEnglish (US)
Pages (from-to)5880-5886
Number of pages7
JournalJournal of Materials Science
Volume29
Issue number22
DOIs
StatePublished - Jan 1 1994

ASJC Scopus subject areas

  • Condensed Matter Physics
  • Electronic, Optical and Magnetic Materials
  • Materials Science(all)

Fingerprint

Dive into the research topics of 'Chromium catalysed silicon nitridation'. Together they form a unique fingerprint.

Cite this