Chemically isolated graphene nanoribbons reversibly formed in fluorographene using polymer nanowire masks

Woo Kyung Lee; Jeremy T. Robinson; Daniel Gunlycke; Rory R. Stine; Cy R. Tamanaha; William P. King; Paul E. Sheehan

doi:10.1021/nl203225w

Chemically isolated graphene nanoribbons reversibly formed in fluorographene using polymer nanowire masks

Woo Kyung Lee, Jeremy T. Robinson, Daniel Gunlycke, Rory R. Stine, Cy R. Tamanaha, William P. King, Paul E. Sheehan

Research output: Contribution to journal › Article › peer-review

Abstract

We demonstrated the fabrication of graphene nanoribbons (GNRs) as narrow as 35 nm created using scanning probe lithography to deposit a polymer mask ^1-3 and then fluorinating the sample to isolate the masked graphene from the surrounding wide band gap fluorographene. The polymer protected the GNR from atmospheric adsorbates while the adjacent fluorographene stably p-doped the GNRs which had electron mobilities of ∼2700 cm ²/(V•s). Chemical isolation of the GNR enabled resetting the device to nearly pristine graphene.

Original language	English (US)
Pages (from-to)	5461-5464
Number of pages	4
Journal	Nano letters
Volume	11
Issue number	12
DOIs	https://doi.org/10.1021/nl203225w
State	Published - Dec 14 2011

Keywords

Graphene nanoribbons
fluorographene
thermal dip-pen nanolithography

ASJC Scopus subject areas

Bioengineering
General Chemistry
General Materials Science
Condensed Matter Physics
Mechanical Engineering

Online availability

10.1021/nl203225w

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abstract = "We demonstrated the fabrication of graphene nanoribbons (GNRs) as narrow as 35 nm created using scanning probe lithography to deposit a polymer mask 1-3 and then fluorinating the sample to isolate the masked graphene from the surrounding wide band gap fluorographene. The polymer protected the GNR from atmospheric adsorbates while the adjacent fluorographene stably p-doped the GNRs which had electron mobilities of ∼2700 cm 2/(V•s). Chemical isolation of the GNR enabled resetting the device to nearly pristine graphene.",

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AU - Lee, Woo Kyung

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AU - Gunlycke, Daniel

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AU - Tamanaha, Cy R.

AU - King, William P.

AU - Sheehan, Paul E.

PY - 2011/12/14

Y1 - 2011/12/14

N2 - We demonstrated the fabrication of graphene nanoribbons (GNRs) as narrow as 35 nm created using scanning probe lithography to deposit a polymer mask 1-3 and then fluorinating the sample to isolate the masked graphene from the surrounding wide band gap fluorographene. The polymer protected the GNR from atmospheric adsorbates while the adjacent fluorographene stably p-doped the GNRs which had electron mobilities of ∼2700 cm 2/(V•s). Chemical isolation of the GNR enabled resetting the device to nearly pristine graphene.

AB - We demonstrated the fabrication of graphene nanoribbons (GNRs) as narrow as 35 nm created using scanning probe lithography to deposit a polymer mask 1-3 and then fluorinating the sample to isolate the masked graphene from the surrounding wide band gap fluorographene. The polymer protected the GNR from atmospheric adsorbates while the adjacent fluorographene stably p-doped the GNRs which had electron mobilities of ∼2700 cm 2/(V•s). Chemical isolation of the GNR enabled resetting the device to nearly pristine graphene.

KW - Graphene nanoribbons

KW - fluorographene

KW - thermal dip-pen nanolithography

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Chemically isolated graphene nanoribbons reversibly formed in fluorographene using polymer nanowire masks

Abstract

Keywords

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