Chemical vapor deposition of copper: Use of a molecular inhibitor to afford uniform nanoislands or smooth films

Keyphrases

• Chemical Vapor Deposition 100%
• Molecular Inhibitors 100%
• Nanoislands 100%
• Copper Film 50%
• Substrate Surface 50%
• Surface Morphology 50%
• Nucleate 50%
• Impurity Atoms 50%
• Reaction Byproducts 50%
• HFACS 50%
• Surface Attachment 50%
• Nucleation Phase 50%
• Copper Island 50%
• Thin Copper Film 50%

Material Science

• Film 100%
• Chemical Vapor Deposition 100%
• Nucleation 33%
• Density 16%
• Surface Morphology 16%

Chemical Engineering

• Vapor Deposition 100%
• Chemical Vapor Deposition 100%