Characterization of sidewall roughness of InP/InGaAsP etched using inductively coupled plasma for low loss optical waveguide applications

J. W. Bae; W. Zhao; J. H. Jang; I. Adesida; A. Lepore; M. Kwakernaak; J. H. Abeles

doi:10.1116/1.1625956

Characterization of sidewall roughness of InP/InGaAsP etched using inductively coupled plasma for low loss optical waveguide applications

J. W. Bae
, W. Zhao
, J. H. Jang
, I. Adesida
, A. Lepore
, M. Kwakernaak
, J. H. Abeles

Electrical and Computer Engineering

Research output: Contribution to journal › Article › peer-review

Original language	English (US)
Pages (from-to)	2888-2891
Number of pages	4
Journal	Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures
Volume	21
Issue number	6
DOIs	https://doi.org/10.1116/1.1625956
State	Published - 2003

ASJC Scopus subject areas

Condensed Matter Physics
Electrical and Electronic Engineering

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10.1116/1.1625956

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Bae, J. W., Zhao, W., Jang, J. H., Adesida, I., Lepore, A., Kwakernaak, M., & Abeles, J. H. (2003). Characterization of sidewall roughness of InP/InGaAsP etched using inductively coupled plasma for low loss optical waveguide applications. Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures, 21(6), 2888-2891. https://doi.org/10.1116/1.1625956

Characterization of sidewall roughness of InP/InGaAsP etched using inductively coupled plasma for low loss optical waveguide applications. / Bae, J. W.; Zhao, W.; Jang, J. H. et al.
In: Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures, Vol. 21, No. 6, 2003, p. 2888-2891.

Research output: Contribution to journal › Article › peer-review

Bae, JW, Zhao, W, Jang, JH, Adesida, I, Lepore, A, Kwakernaak, M & Abeles, JH 2003, 'Characterization of sidewall roughness of InP/InGaAsP etched using inductively coupled plasma for low loss optical waveguide applications', Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures, vol. 21, no. 6, pp. 2888-2891. https://doi.org/10.1116/1.1625956

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AU - Lepore, A.

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Characterization of sidewall roughness of InP/InGaAsP etched using inductively coupled plasma for low loss optical waveguide applications

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