Characterization of sidewall roughness of InP/InGaAsP etched using inductively coupled plasma for low loss optical waveguide applications

J. W. Bae, W. Zhao, J. H. Jang, I. Adesida, A. Lepore, M. Kwakernaak, J. H. Abeles

Research output: Contribution to journalArticlepeer-review

Original languageEnglish (US)
Pages (from-to)2888-2891
Number of pages4
JournalJournal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures
Issue number6
StatePublished - 2003
Externally publishedYes

ASJC Scopus subject areas

  • Condensed Matter Physics
  • Electrical and Electronic Engineering

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