Characterization of collector optic material samples exposed to a discharge-produced plasma extreme ultraviolet light source

Darren A. Alman, Qiu Huatan, T. Spila, Keith C. Thompson, Erik L. Antonsen, Brian E. Jurczyk, D. N. Ruzic

Research output: Contribution to journalArticlepeer-review


Extreme ultraviolet (EUV) light sources with efficient emission at 13.5 nm are needed for next-generation lithography. A critical consideration in the development of such a source is the lifetime of collector optics. These experiments expose optics to a large flux of energetic particles coming from the expansion of the pulsed-plasma EUV source to investigate mirror damage due to erosion, layer mixing, and ion implantation. The debris ion spectra are analyzed using a spherical sector energy analyzer (ESA) showing ion energies of 2 to 13 keV, including Xe+-Xe+4, Ar+, W+, Mo+̀, Fe+, Ni+, and Si+. Microanalysis is performed on samples exposed to 10 million pulses, including atomic force microscopy (AFM), showing increased roughness for most exposed samples. Notably, a Mo-Au Gibbsean segregated alloy showed surface smoothing over this time frame, suggesting that the segregation worked in situ. TRIM predictions for ion implantation are consistent with ion debris measurements from the ESA. Finally, time exposures of samples from 2, 20, and 40 million pulses show an initial roughening with smoothing of the exposed samples at longer time frames. Constant erosion is demonstrated with the SEM. These analyses give an experimental account of the effects of the ion debris field on optic samples exposed to the EUV source.

Original languageEnglish (US)
Article number013006
JournalJournal of Micro/Nanolithography, MEMS, and MOEMS
Issue number1
StatePublished - 2007


  • Collector optics
  • Debris
  • Discharge-produced plasma
  • Erosion
  • Extreme ultraviolet lithography

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Atomic and Molecular Physics, and Optics
  • Condensed Matter Physics
  • Mechanical Engineering
  • Electrical and Electronic Engineering

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