Characterization and decomposition of self-aligned quadruple patterning friendly layout

Hongbo Zhang, Yuelin Du, Martin D.F. Wong, Rasit O. Topaloglu

Research output: Chapter in Book/Report/Conference proceedingConference contribution


Self-aligned quadruple patterning (SAQP) lithography is one of the major techniques for the future process requirement after 16nm/14nm technology node. In this paper, based on the existing knowledge of current 193nm lithography and process flow of SAQP, we will process an early study on the definition of SAQP-friendly layout. With the exploration of the feasible feature regions and possible combinations of adjacent features, we define several simple but important geometry rules to help define the SAQP-friendliness. We also introduce a conflicting graph algorithm to generate the feature region assignment for SAQP decomposition. Our experimental results validate our SAQP-friendly layout definition, and basic circuit building blocks in the low level metal layer are analyzed.

Original languageEnglish (US)
Title of host publicationOptical Microlithography XXV
StatePublished - 2012
EventOptical Microlithography XXV - San Jose, CA, United States
Duration: Feb 13 2012Feb 16 2012

Publication series

NameProceedings of SPIE - The International Society for Optical Engineering
ISSN (Print)0277-786X


OtherOptical Microlithography XXV
Country/TerritoryUnited States
CitySan Jose, CA


  • Characterization
  • Conflicting Graph
  • Decomposition
  • Feature-Region Assignment
  • SAQP
  • Self-Aligned Quadruple Patterning

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Condensed Matter Physics
  • Computer Science Applications
  • Applied Mathematics
  • Electrical and Electronic Engineering


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