Challenging the paradigm of monitor reduction to achieve lower product costs

R. Williams, D. Gudmundsson, R. Nurani, M. Stoller, A. Chatterjee, S. Seshadri, J. G. Shanthikumar

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Abstract

Increasing competition within the semiconductor industry is forcing many manufacturers to consider and implement aggressive cost reduction measures across many operations. In addition, defect inspection steps are often perceived as being non-value add metrology operations, and are frequently the primary focus for further monitor reduction and/or elimination to reduce operational costs. In this paper, the highlights of a joint research project between Intel Corporation and KLA-Tencor Corporation are discussed, with the primary focus on the use of advanced statistical and stochastic models that utilize defect, yield, and financial inputs to hilly characterize the overall costs associated with the monitoring and control of random defect excursions in an advanced semiconductor manufacturing process. The use of the KLA-Tencor Sample PlannerTM program provides a sophisticated methodology to evaluate the overall cost impacts associated with proposed monitor reduction and monitor elimination activities. The analysis illustrated the importance of assessing the yield impact due to defect excursions when pursuing further monitor reduction and/or elimination. In addition, the project results confirmed that the current inspection sampling plan that was being utilized by Intel (with minor modifications), provided a cost-effective allocation of the existing defect inspection capacity. Consequently, the Sample Planner program proved to be an effective tool in challenging the paradigm of monitor reduction to achieve lower product costs in an advanced semiconductor manufacturing line.

Original languageEnglish (US)
Title of host publication10th Annual IEEE/SEMI Advanced Semiconductor Manufacturing Conference and Workshop, ASMC 1999
PublisherInstitute of Electrical and Electronics Engineers Inc.
Pages420-425
Number of pages6
ISBN (Electronic)0780352173, 9780780352179
DOIs
StatePublished - Jan 1 1999
Externally publishedYes
Event10th Annual IEEE/SEMI Advanced Semiconductor Manufacturing Conference and Workshop, ASMC 1999 - Boston, United States
Duration: Sep 8 1999Sep 10 1999

Publication series

Name10th Annual IEEE/SEMI Advanced Semiconductor Manufacturing Conference and Workshop, ASMC 1999

Other

Other10th Annual IEEE/SEMI Advanced Semiconductor Manufacturing Conference and Workshop, ASMC 1999
Country/TerritoryUnited States
CityBoston
Period9/8/999/10/99

ASJC Scopus subject areas

  • Industrial and Manufacturing Engineering
  • Electronic, Optical and Magnetic Materials

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