Carbon nitride thin films prepared by nitrogen ion assisted pulsed laser deposition of graphite using KrF excimer laser

Physics & Astronomy

• atoms 4%
• binding energy 15%
• carbon 18%
• carbon nitrides 84%
• chemical bonds 10%
• electron energy 6%
• energy 19%
• energy dissipation 7%
• excimer lasers 64%
• graphite 55%
• intervals 6%
• ions 4%
• laser deposition 11%
• nitrogen 13%
• nitrogen atoms 21%
• nitrogen ions 79%
• photoelectron spectroscopy 22%
• pulsed laser deposition 61%
• pulsed lasers 7%
• spectroscopy 4%
• stoichiometry 8%
• thin films 33%
• x rays 12%

Engineering & Materials Science

• Atoms 18%
• Binding energy 18%
• Carbon 13%
• Carbon nitride 92%
• Chemical bonds 8%
• Electron energy loss spectroscopy 10%
• Excimer lasers 100%
• Graphite 64%
• Ions 59%
• Pulsed laser deposition 99%
• Pulsed lasers 8%
• Stoichiometry 7%
• Substrates 8%
• Thin films 60%

Chemical Compounds

• Carbon Atom 10%
• Chemical Bond 6%
• Electron Energy Loss Spectroscopy 8%
• Excimer 70%
• Ion 25%
• Liquid Film 10%
• Nitrogen 39%
• Nitrogen Atom 12%
• Oxalonitrile 68%
• Pulsed Laser Deposition 85%
• Reaction Stoichiometry 5%
• X-Ray Photoelectron Spectroscopy 15%