Boundary-based cellwise OPC for standard-cell layouts

David M. Pawlowski, Liang Deng, Martin D.F. Wong

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Abstract

Model based optical proximity correction (OPC) has become necessary at 90nm technology node. Cellwise OPC is an attractive technique to reduce the mask data size as well as the prohibitive runtime of full-chip OPC. As feature dimensions have gotten smaller, the radius of influence for edge features has extended further into neighboring cells such that it is no longer sufficient to perform cellwise OPC independent of neighboring cells, especially for the critical layers. The methodology described in this work accounts for features in neighboring cells and allows a cellwise approach to be applied to cells with a printed gate length of 45nm with the projection that it can also be applied to future technology nodes. OPC-ready cells are generated at library creation (independent of placement) using a boundary-based technique. Each cell has a tractable number of OPC-ready versions due to an intelligent characterization of standard cell layout features. Results are very promising: the average edge placement error (EPE) for all metali features in 100 layouts is 0.731nm which is less than 1% of metali width; the maximum EPE for poly features reduced to 1/3, compared to cellwise OPC without considering boundaries, creating similar levels of lithographic accuracy while obviating any of the drawbacks inherent in layout specific full-chip model-based OPC.

Original languageEnglish (US)
Title of host publicationDesign for Manufacturability through Design-Process Integration
DOIs
StatePublished - Oct 15 2007
EventDesign for Manufacturability through Design-Process Integration - San Jose, CA, United States
Duration: Feb 28 2007Mar 2 2007

Publication series

NameProceedings of SPIE - The International Society for Optical Engineering
Volume6521
ISSN (Print)0277-786X

Other

OtherDesign for Manufacturability through Design-Process Integration
CountryUnited States
CitySan Jose, CA
Period2/28/073/2/07

Keywords

  • Cellwise
  • OPC
  • RET
  • Standard cell library

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Condensed Matter Physics
  • Computer Science Applications
  • Applied Mathematics
  • Electrical and Electronic Engineering

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