Block copolymer directed self-assembly (DSA) aware contact layer optimization for 10 nm 1D standard cell library

Yuelin Du, Daifeng Guo, Martin D.F. Wong, He Yi, H. S.Philip Wong, Hongbo Zhang, Qiang Ma

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Abstract

At the 10 nm technology node, the contact layers of integrated circuits (IC) designs are too dense to be printed by single exposure using 193 nm immersion (193i) lithography. Among all the emerging patterning approaches, block copolymer directed self-assembly (DSA) is a promising candidate with high throughput and low cost for sub-20 nm features. Traditionally, the study of DSA has focused on achieving periodic regular patterns over large area. Realizing that long range order is not needed for patterning irregularly distributed contact holes, we use topographical guiding templates to alter the natural symmetry of block copolymer and achieve controlled irregular DSA patterns. However, DSA patterning must satisfy the overlay accuracy requirements while the guiding templates also need to be printable by conventional lithography. This presents a unique opportunity of DSA patterning and layout design co-optimization for improving the manufacturability of DSA. This paper discusses the DSA-aware contact layer optimization problem for 10 nm 1D standard cell library. For the first time we propose a cost function for each DSA template based on its overlay accuracy performance. Then given a standard cell library, we simultaneously optimize the layouts of every cell, such that the contact layer of any cell in the library can be fully patterned by a set of guiding templates, and the total cost of the templates is minimal. This optimization problem is first proved to be NP-hard and formulated as a Weighted Partial Maximum Satisfiability (MAXSAT) problem, which can be optimally solved with a public SAT solver. Then we propose a bounded approximation algorithm that solves the problem much more efficiently. The experimental results demonstrate that our approach is remarkably promising in practice and validate the proposed optimization problem.

Original languageEnglish (US)
Title of host publication2013 IEEE/ACM International Conference on Computer-Aided Design, ICCAD 2013 - Digest of Technical Papers
Pages186-193
Number of pages8
DOIs
StatePublished - Dec 1 2013
Event2013 32nd IEEE/ACM International Conference on Computer-Aided Design, ICCAD 2013 - San Jose, CA, United States
Duration: Nov 18 2013Nov 21 2013

Publication series

NameIEEE/ACM International Conference on Computer-Aided Design, Digest of Technical Papers, ICCAD
ISSN (Print)1092-3152

Other

Other2013 32nd IEEE/ACM International Conference on Computer-Aided Design, ICCAD 2013
CountryUnited States
CitySan Jose, CA
Period11/18/1311/21/13

Keywords

  • 1D Gridded Design
  • Contact Hole Patterning
  • DSA

ASJC Scopus subject areas

  • Software
  • Computer Science Applications
  • Computer Graphics and Computer-Aided Design

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  • Cite this

    Du, Y., Guo, D., Wong, M. D. F., Yi, H., Wong, H. S. P., Zhang, H., & Ma, Q. (2013). Block copolymer directed self-assembly (DSA) aware contact layer optimization for 10 nm 1D standard cell library. In 2013 IEEE/ACM International Conference on Computer-Aided Design, ICCAD 2013 - Digest of Technical Papers (pp. 186-193). [6691117] (IEEE/ACM International Conference on Computer-Aided Design, Digest of Technical Papers, ICCAD). https://doi.org/10.1109/ICCAD.2013.6691117