Bilayer N-metal Lift-off Process on Thick DBRs Mesa for Low-Threshold VCSELs

Wenning Fu, Dufei Wu, Xin Yu, Milton Feng

Research output: Contribution to conferencePaperpeer-review

Abstract

To reduce VCSEL threshold current for better power efficiency and reduced heat dissipation, one approach is to enhance cavity quality factor “Q” by increasing the number of P-DBR pairs for lower mirror loss. However, the increased p-DBR mesa height results in fabrication challenges. A consequential failure encountered in VCSEL N-metal bilayer lift-off process is reported. The failure mechanism is analyzed in detail, and a modified recipe for stable bilayer N-metal lift-off process is presented.

Original languageEnglish (US)
Pages375-377
Number of pages3
StatePublished - 2022
Externally publishedYes
Event2022 International Conference on Compound Semiconductor Manufacturing Technology, CS MANTECH 2022 - Monterey, United States
Duration: May 9 2022May 12 2022

Conference

Conference2022 International Conference on Compound Semiconductor Manufacturing Technology, CS MANTECH 2022
Country/TerritoryUnited States
CityMonterey
Period5/9/225/12/22

Keywords

  • Vertical-Cavity Surface-Emitting Laser

ASJC Scopus subject areas

  • Hardware and Architecture
  • Electrical and Electronic Engineering

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