@inproceedings{5327323f89504e57a1f5dc6f81787ca9,
title = "Benzocyclobutene (BCB) Process Development and Optimization for High-Speed GaAs VCSELs and Photodetectors",
abstract = "The RIE dry etching of Benzocyclobutene are studied to develop a compatible process for high-speed VCSEL and PD fabrications. SF6, O2 and N2 are selected as the process gases with their functions in the dry etching process explained. Optimal gas ratio of SF6 to O2 is 1:4. Controlled experiments are performed to identify the optimal power and pressure configurations for a new RIE system. The main problem is pointed out to be excessive physical sputtering from experiments. A clean etching recipe is finally developed to produce ideal etching results.",
keywords = "Benzocyclobutene, Reactive Ion Etching",
author = "Dufei Wu and Xin Yu and Peng, {Yu Ting} and Milton Feng",
note = "Publisher Copyright: {\textcopyright} 2021 CS MANTECH 2021 - 2021 International Conference on Compound Semiconductor Manufacturing Technology, Digest of Papers. All Rights Reserved.; 35th Annual International Conference on Compound Semiconductor Manufacturing Technology, CS MANTECH 2021 ; Conference date: 24-05-2021 Through 27-05-2021",
year = "2021",
language = "English (US)",
series = "CS MANTECH 2021 - 2021 International Conference on Compound Semiconductor Manufacturing Technology, Digest of Papers",
publisher = "CS Mantech",
pages = "185--188",
booktitle = "CS MANTECH 2021 - 2021 International Conference on Compound Semiconductor Manufacturing Technology, Digest of Papers",
}