Atomically dispersed precursor for preparing a non-platinum group metal electrocatalyst

Hong Yang (Inventor), Talha Al-Zoubi (Inventor), Yu Zhou (Inventor)

Research output: Patent

Abstract

An atomically dispersed precursor (ADP) for preparing a non-platinum group metal electrocatalyst includes: sacrificial metal centers comprising a sacrificial metal selected from Cd and Zn; metal active sites comprising a transition metal; and first and second ligands linking the sacrificial metal centers and the metal active sites into a network. The ADP may be immobilized on a carbon support. The first and second ligands may comprise N-containing ligands of different carbon chain lengths. Alternatively, the first and second ligands may comprise N-containing ligands and O-containing ligands, respectively.
Original languageEnglish (US)
U.S. patent number11728492
Filing date12/19/19
StatePublished - Aug 15 2023

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