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Atom lithography with near-resonant standing waves
R. Arun
,
Offir Cohen
, I. Sh Averbukh
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peer-review
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Keyphrases
Standing Wave
100%
Atom Lithography
100%
Spontaneous Emission
66%
Emission Effects
66%
Quantum Monte Carlo
33%
Atomic Distribution
33%
Light Field
33%
Quantum Treatment
33%
Non-adiabatic
33%
Minimal Size
33%
Function Simulation
33%
Thick Lenses
33%
Thin Lens
33%
Two-level Atom
33%
Monte Carlo Wave Function
33%
Optimal Focusing
33%
Physics
Standing Wave
100%
Spontaneous Emission
66%
Monte Carlo
33%
Wave Function
33%