Arrays of microplasma-assisted atomic layer deposition and etching free patterning of Ga2O3 thin film with flexible DUV photodetector

Jinhong Kim; Andrey E. Mironov; Dane J. Sievers; Sung Jin Park; J. Gary Eden

Arrays of microplasma-assisted atomic layer deposition and etching free patterning of Ga₂O₃ thin film with flexible DUV photodetector

Jinhong Kim, Andrey E. Mironov, Dane J. Sievers, Sung Jin Park, J. Gary Eden

Research output: Contribution to journal › Conference article › peer-review

Abstract

Microplasma arrays assisted atomic layer deposition (MALD) have been used to deposit gallium oxide (Ga₂O₃) thin film on the rigid and flexible substrate in order to fabricate deep-ultraviolet (DUV) photodetector under 254 nm illumination.

Original language	English (US)
Article number	JTu3A.86
Journal	Optics InfoBase Conference Papers
State	Published - 2021
Externally published	Yes
Event	CLEO: QELS_Fundamental Science, CLEO: QELS 2021 - Part of Conference on Lasers and Electro-Optics, CLEO 2021 - Virtual, Online, United States Duration: May 9 2021 → May 14 2021

ASJC Scopus subject areas

Electronic, Optical and Magnetic Materials
Mechanics of Materials

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title = "Arrays of microplasma-assisted atomic layer deposition and etching free patterning of Ga2O3 thin film with flexible DUV photodetector",

abstract = "Microplasma arrays assisted atomic layer deposition (MALD) have been used to deposit gallium oxide (Ga2O3) thin film on the rigid and flexible substrate in order to fabricate deep-ultraviolet (DUV) photodetector under 254 nm illumination.",

author = "Jinhong Kim and Mironov, {Andrey E.} and Sievers, {Dane J.} and Park, {Sung Jin} and Eden, {J. Gary}",

note = "Publisher Copyright: {\textcopyright} OSA 2021, {\textcopyright} 2021 The Author(s); CLEO: QELS_Fundamental Science, CLEO: QELS 2021 - Part of Conference on Lasers and Electro-Optics, CLEO 2021 ; Conference date: 09-05-2021 Through 14-05-2021",

year = "2021",

language = "English (US)",

journal = "Optics InfoBase Conference Papers",

issn = "2162-2701",

}

TY - JOUR

T1 - Arrays of microplasma-assisted atomic layer deposition and etching free patterning of Ga2O3 thin film with flexible DUV photodetector

AU - Kim, Jinhong

AU - Mironov, Andrey E.

AU - Sievers, Dane J.

AU - Park, Sung Jin

AU - Eden, J. Gary

PY - 2021

Y1 - 2021

N2 - Microplasma arrays assisted atomic layer deposition (MALD) have been used to deposit gallium oxide (Ga2O3) thin film on the rigid and flexible substrate in order to fabricate deep-ultraviolet (DUV) photodetector under 254 nm illumination.

AB - Microplasma arrays assisted atomic layer deposition (MALD) have been used to deposit gallium oxide (Ga2O3) thin film on the rigid and flexible substrate in order to fabricate deep-ultraviolet (DUV) photodetector under 254 nm illumination.

UR - http://www.scopus.com/inward/record.url?scp=85119440571&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=85119440571&partnerID=8YFLogxK

M3 - Conference article

AN - SCOPUS:85119440571

SN - 2162-2701

JO - Optics InfoBase Conference Papers

JF - Optics InfoBase Conference Papers

M1 - JTu3A.86

T2 - CLEO: QELS_Fundamental Science, CLEO: QELS 2021 - Part of Conference on Lasers and Electro-Optics, CLEO 2021

Y2 - 9 May 2021 through 14 May 2021

ER -

Arrays of microplasma-assisted atomic layer deposition and etching free patterning of Ga₂O₃ thin film with flexible DUV photodetector

Abstract

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