Arrays of Microplasma-assisted Atomic Layer Deposition and Etching Free Patterning of Ga2O3Thin Film with Flexible DUV Photodetector

Jinhong Kim, Andrey E. Mironov, Dane J. Sievers, Sung Jin Park, J. Gary Eden

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Abstract

Microplasma arrays assisted atomic layer deposition (MALD) have been used to deposit gallium oxide (Ga2O3) thin film on the rigid and flexible substrate in order to fabricate deep-ultraviolet (DUV) photodetector under 254 nm illumination.

Original languageEnglish (US)
Title of host publication2021 Conference on Lasers and Electro-Optics, CLEO 2021 - Proceedings
PublisherInstitute of Electrical and Electronics Engineers Inc.
ISBN (Electronic)9781943580910
StatePublished - May 2021
Event2021 Conference on Lasers and Electro-Optics, CLEO 2021 - Virtual, Online, United States
Duration: May 9 2021May 14 2021

Publication series

Name2021 Conference on Lasers and Electro-Optics, CLEO 2021 - Proceedings

Conference

Conference2021 Conference on Lasers and Electro-Optics, CLEO 2021
Country/TerritoryUnited States
CityVirtual, Online
Period5/9/215/14/21

ASJC Scopus subject areas

  • Computer Networks and Communications
  • Electrical and Electronic Engineering
  • Electronic, Optical and Magnetic Materials
  • Instrumentation
  • Atomic and Molecular Physics, and Optics

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