Approaches to nanofabrication on Si(100) surfaces: Selective area chemical vapor deposition of metals and selective chemisorption of organic molecules

Keyphrases

• Chemical Vapor Deposition 100%
• Scanning Tunneling Microscope 100%
• Selective Chemisorption 100%
• Si(100) Surface 100%
• Nanofabrication 100%
• Organic Molecules 100%
• Selective-area 100%
• Metal Deposition 100%
• Surface Selective 100%
• Nanostructures 60%
• Nanometer-sized 40%
• Norbornadiene 40%
• Organic Monolayers 40%
• Metal Precursor 40%
• Adlayer 20%
• Low Temperature 20%
• Si(111) 20%
• Reaction Rate 20%
• Ultra-high Vacuum 20%
• Bicyclol 20%
• Spatially Resolved 20%
• Film Growth 20%
• Selective Deposition 20%
• Local Order 20%
• Cycloaddition Reaction 20%
• Passivated 20%
• Titanium Tetrachloride 20%
• 1,5-Dienes 20%
• Microscope Image 20%
• Hydrogen Desorption 20%
• Aluminum Film 20%
• Thermal Chemical Vapor Deposition 20%
• Hydrogen Loss 20%
• Patterned Surface 20%
• Site-selective Reactions 20%
• Selective Chemical Vapor Deposition 20%
• Selective Removal 20%
• Selective Patterning 20%
• Patterned Si 20%
• Selective Metallization 20%
• Carbon-carbon Double Bond 20%

Chemical Engineering

• Nanostructure 100%
• Vapor Deposition 100%
• Chemical Vapor Deposition 100%
• Chemisorption 100%
• Dimer 66%
• Metallizing 33%
• Desorption 33%
• Film 33%

Material Science

• Chemical Vapor Deposition 100%
• Chemisorption 100%
• Surface (Surface Science) 100%
• Nanostructure 37%
• Monolayers 25%
• Aluminum 25%
• Nucleation 12%
• Desorption 12%
• Film Growth 12%
• Thermal Chemical Vapor Deposition 12%