Application of measurement configuration optimization for accurate metrology of sub-wavelength dimensions in multilayer gratings using optical scatterometry

Jinlong Zhu, Yating Shi, Lynford L. Goddard, Shiyuan Liu

Research output: Contribution to journalArticle

Abstract

Critical dimension measurement accuracy in optical scatterometry relies not only on the systematic noise level of instruments and the reliability of forward modeling algorithms, but also heavily on the measurement configuration. To construct a set of potentially high-accuracy configurations, we apply a general measurement configuration optimization method based on error propagation theory and singular value decomposition, by which the measurement accuracy is approximated as a function of a pseudo Jacobian with respect to the measurement configurations. Simulations and experiments for the optical metrology of a sub-wavelength deep-etched multilayer grating establish the feasibility of the proposed method.

Original languageEnglish (US)
Pages (from-to)6844-6849
Number of pages6
JournalApplied Optics
Volume55
Issue number25
DOIs
StatePublished - Sep 1 2016

Fingerprint

Diffraction gratings
metrology
Multilayers
gratings
Wavelength
optimization
configurations
wavelengths
Singular value decomposition
decomposition
propagation
simulation
Experiments

ASJC Scopus subject areas

  • Atomic and Molecular Physics, and Optics
  • Engineering (miscellaneous)
  • Electrical and Electronic Engineering

Cite this

Application of measurement configuration optimization for accurate metrology of sub-wavelength dimensions in multilayer gratings using optical scatterometry. / Zhu, Jinlong; Shi, Yating; Goddard, Lynford L.; Liu, Shiyuan.

In: Applied Optics, Vol. 55, No. 25, 01.09.2016, p. 6844-6849.

Research output: Contribution to journalArticle

@article{02e8c2066b524332b471ff575de9ecbf,
title = "Application of measurement configuration optimization for accurate metrology of sub-wavelength dimensions in multilayer gratings using optical scatterometry",
abstract = "Critical dimension measurement accuracy in optical scatterometry relies not only on the systematic noise level of instruments and the reliability of forward modeling algorithms, but also heavily on the measurement configuration. To construct a set of potentially high-accuracy configurations, we apply a general measurement configuration optimization method based on error propagation theory and singular value decomposition, by which the measurement accuracy is approximated as a function of a pseudo Jacobian with respect to the measurement configurations. Simulations and experiments for the optical metrology of a sub-wavelength deep-etched multilayer grating establish the feasibility of the proposed method.",
author = "Jinlong Zhu and Yating Shi and Goddard, {Lynford L.} and Shiyuan Liu",
year = "2016",
month = "9",
day = "1",
doi = "10.1364/AO.55.006844",
language = "English (US)",
volume = "55",
pages = "6844--6849",
journal = "Applied Optics",
issn = "0003-6935",
publisher = "The Optical Society",
number = "25",

}

TY - JOUR

T1 - Application of measurement configuration optimization for accurate metrology of sub-wavelength dimensions in multilayer gratings using optical scatterometry

AU - Zhu, Jinlong

AU - Shi, Yating

AU - Goddard, Lynford L.

AU - Liu, Shiyuan

PY - 2016/9/1

Y1 - 2016/9/1

N2 - Critical dimension measurement accuracy in optical scatterometry relies not only on the systematic noise level of instruments and the reliability of forward modeling algorithms, but also heavily on the measurement configuration. To construct a set of potentially high-accuracy configurations, we apply a general measurement configuration optimization method based on error propagation theory and singular value decomposition, by which the measurement accuracy is approximated as a function of a pseudo Jacobian with respect to the measurement configurations. Simulations and experiments for the optical metrology of a sub-wavelength deep-etched multilayer grating establish the feasibility of the proposed method.

AB - Critical dimension measurement accuracy in optical scatterometry relies not only on the systematic noise level of instruments and the reliability of forward modeling algorithms, but also heavily on the measurement configuration. To construct a set of potentially high-accuracy configurations, we apply a general measurement configuration optimization method based on error propagation theory and singular value decomposition, by which the measurement accuracy is approximated as a function of a pseudo Jacobian with respect to the measurement configurations. Simulations and experiments for the optical metrology of a sub-wavelength deep-etched multilayer grating establish the feasibility of the proposed method.

UR - http://www.scopus.com/inward/record.url?scp=84987623957&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=84987623957&partnerID=8YFLogxK

U2 - 10.1364/AO.55.006844

DO - 10.1364/AO.55.006844

M3 - Article

AN - SCOPUS:84987623957

VL - 55

SP - 6844

EP - 6849

JO - Applied Optics

JF - Applied Optics

SN - 0003-6935

IS - 25

ER -