Application of measurement configuration optimization for accurate metrology of sub-wavelength dimensions in multilayer gratings using optical scatterometry

Jinlong Zhu, Yating Shi, Lynford L. Goddard, Shiyuan Liu

Research output: Contribution to journalArticle

Abstract

Critical dimension measurement accuracy in optical scatterometry relies not only on the systematic noise level of instruments and the reliability of forward modeling algorithms, but also heavily on the measurement configuration. To construct a set of potentially high-accuracy configurations, we apply a general measurement configuration optimization method based on error propagation theory and singular value decomposition, by which the measurement accuracy is approximated as a function of a pseudo Jacobian with respect to the measurement configurations. Simulations and experiments for the optical metrology of a sub-wavelength deep-etched multilayer grating establish the feasibility of the proposed method.

Original languageEnglish (US)
Pages (from-to)6844-6849
Number of pages6
JournalApplied Optics
Volume55
Issue number25
DOIs
StatePublished - Sep 1 2016

ASJC Scopus subject areas

  • Atomic and Molecular Physics, and Optics
  • Engineering (miscellaneous)
  • Electrical and Electronic Engineering

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