Apparatus and method for depositing a coating on a substrate at atmospheric pressure

Ivan A Shchelkanov; Jungmi Hong; Tae Seung Cho; Yuilun Wu; David N Ruzic; Zihao Ouyang

Apparatus and method for depositing a coating on a substrate at atmospheric pressure

Ivan A Shchelkanov (Inventor), Jungmi Hong (Inventor), Tae Seung Cho (Inventor), Yuilun Wu (Inventor), David N Ruzic (Inventor), Zihao Ouyang (Inventor)

Research output: Patent

Abstract

An apparatus for depositing a coating on a substrate at atmospheric pressure comprises (a) a plasma torch comprising a microwave source coupled to an antenna disposed within a chamber having an open end, the chamber comprising a gas inlet for flow of a gas over the antenna to generate a plasma jet; (b) a substrate positioned outside the open end of the chamber a predetermined distance away from a tip of the antenna; and (c) a target material to be coated on the substrate disposed at the tip of the antenna.

Original language	English (US)
U.S. patent number	10167556
State	Published - Jan 1 2019

Library availability

Discover UIUC Full Text

Cite this

@misc{0d3462a2602a4242b62158174c5cf3ee,

title = "Apparatus and method for depositing a coating on a substrate at atmospheric pressure",

abstract = "An apparatus for depositing a coating on a substrate at atmospheric pressure comprises (a) a plasma torch comprising a microwave source coupled to an antenna disposed within a chamber having an open end, the chamber comprising a gas inlet for flow of a gas over the antenna to generate a plasma jet; (b) a substrate positioned outside the open end of the chamber a predetermined distance away from a tip of the antenna; and (c) a target material to be coated on the substrate disposed at the tip of the antenna.",

author = "Shchelkanov, {Ivan A} and Jungmi Hong and Cho, {Tae Seung} and Yuilun Wu and Ruzic, {David N} and Zihao Ouyang",

year = "2019",

month = jan,

day = "1",

language = "English (US)",

type = "Patent",

note = "10167556",

}

TY - PAT

T1 - Apparatus and method for depositing a coating on a substrate at atmospheric pressure

AU - Shchelkanov, Ivan A

AU - Hong, Jungmi

AU - Cho, Tae Seung

AU - Wu, Yuilun

AU - Ruzic, David N

AU - Ouyang, Zihao

PY - 2019/1/1

Y1 - 2019/1/1

N2 - An apparatus for depositing a coating on a substrate at atmospheric pressure comprises (a) a plasma torch comprising a microwave source coupled to an antenna disposed within a chamber having an open end, the chamber comprising a gas inlet for flow of a gas over the antenna to generate a plasma jet; (b) a substrate positioned outside the open end of the chamber a predetermined distance away from a tip of the antenna; and (c) a target material to be coated on the substrate disposed at the tip of the antenna.

AB - An apparatus for depositing a coating on a substrate at atmospheric pressure comprises (a) a plasma torch comprising a microwave source coupled to an antenna disposed within a chamber having an open end, the chamber comprising a gas inlet for flow of a gas over the antenna to generate a plasma jet; (b) a substrate positioned outside the open end of the chamber a predetermined distance away from a tip of the antenna; and (c) a target material to be coated on the substrate disposed at the tip of the antenna.

M3 - Patent

M1 - 10167556

ER -

Apparatus and method for depositing a coating on a substrate at atmospheric pressure

Abstract

Library availability

Fingerprint

Cite this