Antiferromagnetic Oxide Thin Films for Spintronic Applications

Saima Afroz Siddiqui, Deshun Hong, John E. Pearson, Axel Hoffmann

Research output: Contribution to journalArticlepeer-review


Antiferromagnetic oxides have recently gained much attention because of the possibility to manipulate electrically and optically the Néel vectors in these materials. Their ultrafast spin dynamics, long spin diffusion length and immunity to large magnetic fields make them attractive candidates for spintronic applications. Additionally, there have been many studies on spin wave and magnon transport in single crystals of these oxides. However, the successful applications of the antiferromagnetic oxides will require similar spin transport properties in thin films. In this work, we systematically show the sputtering deposition method for two uniaxial antiferromagnetic oxides, namely Cr2O3 and α-Fe2O3, on A-plane sapphire substrates, and identify the optimized deposition conditions for epitaxial films with low surface roughness. We also confirm the antiferromagnetic properties of the thin films. The deposition method developed in this article will be important for studying the magnon transport in these epitaxial antiferromagnetic thin films.
Original languageEnglish (US)
Issue number7
StatePublished - Jun 2021


  • chromium oxide
  • antiferromagnetic oxides
  • roughness
  • epitaxial thin film
  • reactive magnetron sputtering
  • hematite


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