Abstract
A study of selectively excited photoluminescence (PL) at approximately 6 K in Er-implanted GaN as a function of annealing temperature (400-1000 °C) has detected nine different Er3+ centers with distinct approximately 1540 nm 4I13/2→4I15/2 Er3+ PL spectra and different activation temperatures. However, most of the optically active implanted Er atoms are incorporated at annealing temperatures as low as 400 °C on a single type of center for which PL can only be excited efficiently by direct intra-4f shell absorption and is not strongly pumped by either above-gap or broad-band below-gap absorption. This strongly suggests that this high-concentration Er3+ center is an isolated, isoelectronic center consistent with Er3+ substituted on a Ga site. In contrast, a very small fraction of the Er atoms that form a variety of Er-defect/impurity complexes dominate the Er3+ emission spectra excited by above-gap and broad-band below-gap absorption because of their larger cross sections for both carrier capture and optical absorption.
| Original language | English (US) |
|---|---|
| Pages (from-to) | 266-274 |
| Number of pages | 9 |
| Journal | Journal of Electronic Materials |
| Volume | 28 |
| Issue number | 3 |
| DOIs | |
| State | Published - Mar 1999 |
| Event | Proceedings of the 1998 40th Electronic Materials Conference, EMC-98 - Charlottesville, VA, USA Duration: Jun 24 1998 → Jun 26 1998 |
ASJC Scopus subject areas
- Electronic, Optical and Magnetic Materials
- Condensed Matter Physics
- Electrical and Electronic Engineering
- Materials Chemistry