@article{641acc9546a0473cb83e6b5aee5f1bbd,
title = "Angstrom-scale imaging of magnetization in antiferromagnetic Fe2As via 4D-STEM",
abstract = "We demonstrate a combination of computational tools and experimental 4D-STEM methods to image the local magnetic moment in antiferromagnetic Fe2As with 6 angstrom spatial resolution. Our techniques utilize magnetic diffraction peaks, common in antiferromagnetic materials, to create imaging modes that directly visualize the magnetic lattice. Using this approach, we show that center-of-mass analysis can determine the local magnetization component in the plane perpendicular to the path of the electron beam. Moreover, we develop Magnstem, a quantum mechanical electron scattering simulation code, to model electron scattering of an angstrom-scale probe from magnetic materials. Using these tools, we identify optimal experimental conditions for separating weak magnetic signals from the much stronger interactions of an angstrom-scale probe with electrostatic potentials. Our techniques should be useful for characterizing the local magnetic order in systems such in thin films, interfaces, and domain boundaries of antiferromagnetic materials, which are difficult to probe with existing methods.",
keywords = "4D-STEM, Antiferromagnetism, FeAs, Magnetic imaging",
author = "Nguyen, {Kayla X.} and Jeffrey Huang and Karigerasi, {Manohar H.} and Kisung Kang and Cahill, {David G.} and Zuo, {Jian Min} and Andr{\'e} Schleife and Shoemaker, {Daniel P.} and Huang, {Pinshane Y.}",
note = "The authors thank D. A. Muller for useful discussions. This work was supported by the Air Force Office of Scientific Research, United States under award number FA9550-20-1-0302. K.X.N. is also supported in part by the L'Oreal For Women in Science Postdoctoral Fellowship, United States. J.H. is partially supported by the DIGI-MAT program through National Science Foundation, United States under Grant No. 1922758. Electron microscopy facilities were provided by the University of Illinois Materials Research Laboratory and the Cornell Center for Materials Research through the National Science Foundation MRSEC program, United States through award DMR-1719875. The crystal growth and density functional calculations were supported by the Illinois Materials Research Science and Engineering Center through the National Science Foundation MRSEC program, United States, award DMR-1720633. This work made use of the Illinois Campus Cluster, a computing resource that is operated by the Illinois Campus Cluster Program (ICCP) in conjunction with the National Center for Supercomputing Applications (NCSA) and which is supported by funds from the University of Illinois at Urbana-Champaign, United States. The authors thank D. A. Muller for useful discussions. This work was supported by the Air Force Office of Scientific Research, United States under award number FA9550-20-1-0302 . K.X.N. is also supported in part by the L\u2019Oreal For Women in Science Postdoctoral Fellowship, United States . J.H. is partially supported by the DIGI-MAT program through National Science Foundation, United States under Grant No. 1922758 . Electron microscopy facilities were provided by the University of Illinois Materials Research Laboratory and the Cornell Center for Materials Research through the National Science Foundation MRSEC program, United States through award DMR-1719875 . The crystal growth and density functional calculations were supported by the Illinois Materials Research Science and Engineering Center through the National Science Foundation MRSEC program, United States , award DMR-1720633 . This work made use of the Illinois Campus Cluster, a computing resource that is operated by the Illinois Campus Cluster Program (ICCP) in conjunction with the National Center for Supercomputing Applications (NCSA) and which is supported by funds from the University of Illinois at Urbana-Champaign, United States .",
year = "2023",
month = may,
doi = "10.1016/j.ultramic.2023.113696",
language = "English (US)",
volume = "247",
journal = "Ultramicroscopy",
issn = "0304-3991",
publisher = "Elsevier B.V.",
}