Andreev reflection in the fractional quantum Hall effect

Nancy P. Sandler, Claudio C. de Chamon, Eduardo Fradkin

Research output: Contribution to journalArticlepeer-review

Abstract

We study the reflection of electrons and quasiparticles on point-contact interfaces between fractional quantum Hall (FQH) states and normal metals (leads), as well as interfaces between two FQH states with mismatched filling fractions. We classify the processes taking place at the interface in the strong-coupling limit. In this regime a set of quasiparticles can decay into quasiholes on the FQH side and charge excitations on the other side of the junction. This process is analogous to an Andreev reflection in normal-metal/superconductor (N-S) interfaces.

Original languageEnglish (US)
Pages (from-to)12324-12332
Number of pages9
JournalPhysical Review B - Condensed Matter and Materials Physics
Volume57
Issue number19
DOIs
StatePublished - 1998

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Condensed Matter Physics

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